Rolling nanolithography can take the linewith resolution of R2R lighography even below 1um. This technology, by Meta Inc (Meta Materials Inc) includes a roller around which a mask is wraped and within which a UV light sits. The wrap-aroud mask itself it manufactured using electron beam lithography, giving it very fine features. Therefore, the mask can support, like nanoimprint technology, nano-meter scale features. However, the UV exposure itself may limit feature size to 500nm or 1um range.
The current web size is 300mm although Meta is developing technology to scale this to 1200mm webwidths. Here, a step-and-repeat process can be used to create larger rolling masks (note: there might be some 100um wide discontinuities and thus may not be fully seamless, although they are workarounds for this).
To achieve single-layer ultrafine line metallizaiton, first a photoresist is deposted and then patterned using the rolling UV mask. Next, a thin metal layer is R2R evaporated (AI or Ag, for example) before creating the final pattern in a R2R lift-off process. Ultra fine features with excellent aspect ratio (300nm/100nm) can be achieved.
This is a wide web industrial R2R or R2S process that can print few micron or even sub-micron features on 1.2m wide webs at lenghts of 6 km and at print speeds around 2-10 m/min speeds.
The embedded slides show examples of products. On slide 2, you can see the examples of fine feature sizes achieved, putting the technology in the same feature size range as silver nanowires. In slide 3, you can see the demonstration of Al and Ag metal mesh with L/S of 500nm/30um achieving 3.5-5 ohm/sqr at 96% transparency. The bechmarking chart shows that this nanoweb technology can outperform all the other options in terms of its low sheet resistance and high transparency.
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