Speaker: Abe Masayuki | Company: Asahi Kasei | Date: 9-10 March 2022 | Full Presentation
For high performance and practical use of printed electronics devices, it is important to have a printing technology that can industrially form electrodes with submicron resolution. We have developed our own electron beam lithography technology as a patterning technology for cylindrical plates in order to achieve both mass productivity and high resolution. We have also developed our own metal nano-ink with an average agglomerate diameter of less than several tens of nanometers, as well as our own R2R printing process and equipment. I will introduce these technologies and the hybrid type transparent RFID tag produced by applying these technologies.
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